The first Russian photolithograph with a resolution of 350 nanometers was created at SEZ "Technopolis Moscow"

Technopolis Moscow SEZ Develops Russia’s First Photolithograph with 350-Nanometer Resolution                                                                                    
Moscow Mayor Sergey Sobyanin announced that the first Russian photolithograph with a resolution of 350 nanometers has been developed at the Technopolis Moscow Special Economic Zone (SEZ).
“Today, fewer than ten countries worldwide are capable of creating this type of critical equipment for microchip manufacturing. Russia has now joined their ranks. This marks a fundamental step toward establishing domestic microelectronics production and ensuring the country’s full technological sovereignty,” emphasized the Mayor.
The project was implemented in partnership with a Belarusian enterprise with extensive expertise in photolithography systems.
According to Sobyanin, the new installation has significant advantages compared to its foreign counterparts:
“For the first time, instead of a mercury lamp, a solid-state laser was used as the source of radiation. It is powerful, energy-efficient, highly durable, and provides a narrower spectrum.”
The Mayor noted that the photolithograph already has a confirmed customer, and technological processes are being adapted to meet the specific requirements of the end user.
In parallel, development is underway on the next-generation system with a 130-nanometer resolution, which is scheduled for completion in 2026.